SPIN 200i-ind ½ºÇÉÄÚÅÍ(Å°º¸µå ºÐ¸®Çü)

½Ì±ÛÇÁ·Î¼¼½º¿ë ½ºÇÉÄÚÅÍ
   ¿ëµµ :cleaning, drying, coating, developing and/or etching of up to Ø260mm substrates:

 
     
  • °¡´É»çÀÌÁî: up to Ø260mm wafer,150mm x 150mm
  • ÀçÁú      : Full Ç÷¡½ºÆ½ ÇÏ¿ì¡(NPP) -¿É¼ÇÀ¸·Î Å×Ç÷РÀçÁú ¼±Åð¡´É
  • RPM      :0-12,000RPM,
  • Accuracy :+ - 1RPM, APT German DC Servo Motor
  • Step      :Unlimited Step &Memory
  • Acceleration / Deceleration : 1-30,000rpm/sec, stepº°·Î ¼³Á¤°¡´É
  • ȸÀü¹æÇâ º¯µ¿°¡´É : (CW, CCW, puddling)
  • Time      : 0.1~99999sec
  • Ä÷¯ÅÍÄ¡½ºÅ©¸°À» ÅëÇÑ ½¬¿î ´Ü°èº° ¸Þ¸ð¸® ÇÁ·Î±×·¥ °¡´É
  • ±Û·Îºê ¹Ú½º³» ¼³Ä¡°¡ ¿ëÀÌÇÑ ÃÖ¼ÒÇü »çÀÌÁî : 380mm(W) x 307mm(H) x559(D) mm :
                                               Å°ÆеåºÐ¸®½Ã : 380mm(W) x 307mm(H) x400mm(D)
    -Å°º¸µåºÐ¸®Çü


  •   Vacuum On/Off
  • 3 Programmable Dry Contacts: for automated control of Dispense unit, Nitrogen diffuser, etc.
  •   °íÁ¤¹Ð µ¶ÀÏÁ¦ DC ¼­º¸ ¸ðÅÍ »ç¿ë :ÃÖ°íÀÇ Coating Thickness Uniformaty °¡´É
      - Digitally controlled Motor with digital incremental speed signal feed back
  •   Åõ¸íÇÑ ¶Ñ²±¹× :Áß¾Ó¿¡ µð½ºÆæ½Ì¿ë ½Ã¸°Áö Ȧ´õ¿ë Hall :¼öµ¿ µð½ºÆæ½Ì or¿ÀÅäµð½ºÆæ½Ì(Ãß°¡Å°Æ® ÇÊ¿ä) °¡´É
  •   Automatic safety lid lock with sensor interlock
  •   ºÐ¸® °¡´ÉÇÑ ÄÁÆ®·Ñ·¯(ÄÁÆ®·ÑÆеå)
  •   N2 diffuser for N2 purge during process
  •   Structured and password protected recipe storage for easy and safe management
      

Æ÷ÇÔ : standard Vacuum Chuck A-V87-S96-PP-HD ¨ª96mm for up to ¨ª8¡° wafers.
      
       Drain connection 1¡± male NPT

      

 
     


  

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Tel. +031-479-4211/2 jsi@jsits.com

SPIN200i Specifications